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Title: Charge transfer in crystalline germanium/monolayer MoS 2 heterostructures prepared by chemical vapor deposition

Journal Article · · Nanoscale
DOI:https://doi.org/10.1039/C6NR03621J· OSTI ID:1375868
 [1];  [2]; ORCiD logo [3];  [4];  [5];  [6]; ORCiD logo [3];  [7]; ORCiD logo [7]; ORCiD logo [1]
  1. Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies
  2. Northeastern Univ., Boston, MA (United States). Dept. of Physics; Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Materials Physics and Applications-11
  3. Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
  4. Univ. of California, San Diego, CA (United States). Dept. of Electrical and Computer Engineering
  5. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for Integrated Nanotechnologies
  6. Northeastern Univ., Boston, MA (United States). Dept. of Physics
  7. Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Materials Physics and Applications-11

Heterostructuring provides novel opportunities for exploring emergent phenomena and applications by developing designed properties beyond those of homogeneous materials. Advances in nanoscience enable the preparation of heterostructures formed incommensurate materials. Two-dimensional (2D) materials, such as graphene and transition metal dichalcogenides, are of particular interest due to their distinct physical characteristics. There have been recent changes in new research areas related to 2D/2D heterostructures. But, other heterostructures such as 2D/three-dimensional (3D) materials have not been thoroughly studied yet although the growth of 3D materials on 2D materials creating 2D/3D heterostructures with exceptional carrier transport properties has been reported. Here also we report a novel heterostructure composed of Ge and monolayer MoS2, prepared by chemical vapor deposition. A single crystalline Ge (110) thin film was grown on monolayer MoS2. The electrical characteristics of Ge and MoS2 in the Ge/MoS2 heterostructure were remarkably different from those of isolated Ge and MoS2. The field-effect conductivity type of the monolayer MoS2 is converted from n-type to p-type by growth of the Ge thin film on top of it. Undoped Ge on MoS2 is highly conducting. The observations can be explained by charge transfer in the heterostructure as opposed to chemical doping via the incorporation of impurities, based on our first-principles calculations.

Research Organization:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
AC52-06NA25396
OSTI ID:
1375868
Report Number(s):
LA-UR-16-22544; NANOHL
Journal Information:
Nanoscale, Vol. 8, Issue 44; ISSN 2040-3364
Publisher:
Royal Society of ChemistryCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 19 works
Citation information provided by
Web of Science

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Cited By (4)

Recent Progress on Two‐Dimensional Heterostructures for Catalytic, Optoelectronic, and Energy Applications journal April 2019
Integration of bulk materials with two-dimensional materials for physical coupling and applications journal May 2019
A roadmap for electronic grade 2D materials journal January 2019
Schottky-barrier modulation at germanium/monolayer MoS 2 heterojunction interface: the roles of passivation and interfacial layer journal February 2020