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Title: Underpotential deposition-mediated layer-by-layer growth of thin films

Patent ·
OSTI ID:1366730

A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves electrochemically exchanging a mediating element on a substrate with a noble metal film by alternatingly sweeping potential in forward and reverse directions for a predetermined number of times in an electrochemical cell. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis.

Research Organization:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-98CH10886
Assignee:
Brookhaven Science Associates, LLC
Patent Number(s):
9,689,085
Application Number:
14/689,708
OSTI ID:
1366730
Resource Relation:
Patent File Date: 2015 Apr 17
Country of Publication:
United States
Language:
English

References (5)

Platinum- and platinum alloy-coated palladium and palladium alloy particles and uses thereof patent-application June 2006
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Overpotential deposition of Ag monolayer and bilayer on Au(111) mediated by Pb adlayer underpotential deposition/stripping cycles journal August 2003
Platinum Monolayer on Nonnoble Metal−Noble Metal Core−Shell Nanoparticle Electrocatalysts for O2 Reduction journal December 2005
Pt submonolayers on metal nanoparticles—novel electrocatalysts for H2 oxidation and O2 reduction journal November 2003