Sputtering of pure boron using a magnetron without a radio-frequency supply

Oks, Efim; Anders, André; Nikolaev, Alexey; Yushkov, Yury

doi:10.1063/1.4980149

Title: Sputtering of pure boron using a magnetron without a radio-frequency supply

Journal Article · Sat Apr 01 00:00:00 EDT 2017 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4980149· OSTI ID:1361821

Oks, Efim ^[1];

^[2];

^[3]; Yushkov, Yury ^[1]

Institute of High Current Electronics SB RAS, 2/3 Academichesky Ave., Tomsk 634055, Russia, Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., Tomsk 634050, Russia
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
Institute of High Current Electronics SB RAS, 2/3 Academichesky Ave., Tomsk 634055, Russia

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Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1361821

Journal Information:: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Vol. 88 Journal Issue: 4; ISSN 0034-6748

Publisher:: American Institute of PhysicsCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 8 works

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References (19)

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Ultra-hard AlMgB14 coatings fabricated by RF magnetron sputtering from a stoichiometric target Grishin, A. M.; Khartsev, S. I.; Böhlmark, J. JETP Letters, Vol. 100, Issue 10 https://doi.org/10.1134/s0021364014220056	journal	January 2015
Properties of iron boride films prepared by magnetron sputtering Dehlinger, A. S.; Pierson, J. F.; Roman, A. Surface and Coatings Technology, Vol. 174-175 https://doi.org/10.1016/s0257-8972(03)00399-2	journal	September 2003
Preparation, properties and applications of boron nitride thin films Arya, S. P. S.; D'Amico, A. Thin Solid Films, Vol. 157, Issue 2 https://doi.org/10.1016/0040-6090(88)90008-9	journal	February 1988
Pulsed magnetron sputter technology Schiller, S.; Goedicke, K.; Reschke, J. Surface and Coatings Technology, Vol. 61, Issue 1-3 https://doi.org/10.1016/0257-8972(93)90248-m	journal	December 1993
Modified layer formation by means of high current density nitrogen and boron implantation Uglov, V. V.; Rusalsky, D. P.; Khodasevich, V. V. Surface and Coatings Technology, Vol. 103-104 https://doi.org/10.1016/s0257-8972(98)00407-1	journal	May 1998
The constitution and properties of cubic boron nitride thin films: a comparative study on the influence of bombarding ion energy Sell, K.; Ulrich, S.; Nold, E. Surface and Coatings Technology, Vol. 174-175 https://doi.org/10.1016/s0257-8972(03)00533-4	journal	September 2003
A quasi‐direct‐current sputtering technique for the deposition of dielectrics at enhanced rates Este, G.; Westwood, W. D. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 6, Issue 3 https://doi.org/10.1116/1.575266	journal	May 1988
Ion implantation boriding of iron and AISI M2 steel using a high-current density, low energy, broad-beam ion source Davis, J. A.; Wilbur, P. J.; Williamson, D. L. Surface and Coatings Technology, Vol. 103-104 https://doi.org/10.1016/s0257-8972(98)00374-0	journal	May 1998
Reactive alternating current magnetron sputtering of dielectric layers Scherer, M.; Schmitt, J.; Latz, R. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 10, Issue 4 https://doi.org/10.1116/1.577745	journal	July 1992
Sputtered thermionic hexaboride coatings Waldhauser, W.; Mitterer, C.; Laimer, J. Surface and Coatings Technology, Vol. 98, Issue 1-3 https://doi.org/10.1016/s0257-8972(97)00263-6	journal	January 1998
Energy fluxes in a radio-frequency magnetron discharge for the deposition of superhard cubic boron nitride coatings Bornholdt, S.; Ye, J.; Ulrich, S. Journal of Applied Physics, Vol. 112, Issue 12 https://doi.org/10.1063/1.4769800	journal	December 2012
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Deposition of multicomponent chromium boride based coatings by pulsed magnetron sputtering of powder targets Audronis, M.; Kelly, P. J.; Arnell, R. D. Surface and Coatings Technology, Vol. 200, Issue 5-6 https://doi.org/10.1016/j.surfcoat.2005.08.089	journal	November 2005

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