Optical emission diagnostics of plasmas in chemical vapor deposition of single-crystal diamond

Journal Article · Mon Aug 03 00:00:00 EDT 2015 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.4928031· OSTI ID:1335676

Hemawan, Kadek W. ^[1]; Hemley, Russell J. ^[2]

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1. Carnegie Institution of Washington, Washington, D.C. (United States); Carnegie Institution of Washington
2. Carnegie Institution of Washington, Washington, D.C. (United States)

Here, a key aspect of single crystal diamond growth via microwave plasma chemical vapor deposition is in-process control of the local plasma-substrate environment, that is, plasma gas phase concentrations of activated species at the plasma boundary layer near the substrate surface. Emission spectra of the plasma relative to the diamond substrate inside the microwave plasma reactor chamber have been analyzed via optical emission spectroscopy. The spectra of radical species such as CH, C₂, and H (Balmer series) important for diamond growth were found to be more depndent on operating pressure than on microwave power. Plasma gas temperatures were calculated from measurements of the C₂ Swan band (d³Π → a³Π transition) system. The plasma gas temperature ranges from 2800 to 3400 K depending on the spatial location of the plasma ball, microwave power and operating pressure. Addition of Ar into CH₄ + H₂ plasma input gas mixture has little influence on the Hα, Hβ, and Hγ intensities and single-crystal diamond growth rates.

• Research Organization: Carnegie Institution of Washington, Washington, D.C. (United States); Energy Frontier Research Centers (EFRC) (United States). Energy Frontier Research in Extreme Environments (EFree)
• Sponsoring Organization: USDOE; USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
• Grant/Contract Number: NA0002006; SC0001057
• OSTI ID: 1335676
• Alternate ID(s): OSTI ID: 1420498; OSTI ID: 22479664
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Issue: 6 Vol. 33; ISSN 0734-2101; ISSN JVTAD6
• Publisher: American Vacuum Society
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
microwave plasma
optical emission diagnostics
single-crystal diamond