Nanofabrication on unconventional substrates using transferred hard masks

Li, Luozhou; Bayn, Igal; Lu, Ming; Nam, Chang -Yong; Schroder, Tim; Stein, Aaron; Harris, Nicholas C.; Englund, Dirk

doi:10.1038/srep07802

Nanofabrication on unconventional substrates using transferred hard masks

Journal Article · Wed Jan 14 23:00:00 EST 2015 · Scientific Reports

DOI:https://doi.org/10.1038/srep07802· OSTI ID:1258778

Li, Luozhou ^[1]; Bayn, Igal ^[1]; Lu, Ming ^[2]; Nam, Chang -Yong ^[2]; Schroder, Tim ^[1]; Stein, Aaron ^[3]; Harris, Nicholas C. ^[1]; Englund, Dirk ^[1]

Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States). Dept. of Electrical Engineering and Computer Science
Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials (CFN)
Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials

Here, a major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates.

View Accepted Manuscript (DOE)

Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-98CH10886

OSTI ID:: 1258778

Journal Information:: Scientific Reports, Journal Name: Scientific Reports Vol. 5; ISSN 2045-2322

Publisher:: Nature Publishing GroupCopyright Statement

Country of Publication:: United States

Language:: English

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