Efficiency of a multilayer-Laue-lens with a 102 μm aperture

Macrander, Albert T.; Kubec, Adam; Conley, Raymond; Bouet, Nathalie; Zhou, Juan; Wojcik, Michael; Maser, Jorg

doi:10.1063/1.4929505

Efficiency of a multilayer-Laue-lens with a 102 μm aperture

Journal Article · Tue Aug 25 04:00:00 EDT 2015 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4929505· OSTI ID:1239773

Macrander, Albert T. ^[1]; Kubec, Adam ^[2]; Conley, Raymond ^[3]; Bouet, Nathalie ^[4]; Zhou, Juan ^[4]; Wojcik, Michael ^[1]; Maser, Jorg ^[1]

Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source; Fraunhofer IWS Dresden (Germany)
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source; Brookhaven National Lab. (BNL), Upton, NY (United States)
Brookhaven National Lab. (BNL), Upton, NY (United States)

A multilayer-Laue-lens (MLL) comprised of WSi₂/Al layers stacked to a full thickness of 102 microns was characterized for its diffraction efficiency and dynamical diffraction properties by x-ray measurements made in the far field. The achieved aperture roughly doubles the previous maximum reported aperture for an MLL, thereby doubling the working distance. Negative and positive first orders were found to have 14.2 % and 13.0 % efficiencies, respectively. A section thickness of 9.6 μm was determined from Laue-case thickness fringes in the diffraction data. A background gas consisting of 90 % Ar and 10 % N₂ was used for sputtering. This material system was chosen to reduce grown-in stress as the multilayer is deposited. Although some regions of the full MLL exhibited defects, the presently reported results were obtained for a region devoid of defects. The data compare well to dynamical diffraction calculations with Coupled Wave Theory (CWT) which provided confirmation of the optical constants and densities assumed for the CWT calculations.

View Accepted Manuscript (DOE)

Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

OSTI ID:: 1239773

Alternate ID(s):: OSTI ID: 1229639
OSTI ID: 22489150
OSTI ID: 1392419

Report Number(s):: BNL--108332-2015-JA

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 8 Vol. 107; ISSN APPLAB; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Interlaced zone plate optics for hard X-ray imaging in the 10 nm range Mohacsi, Istvan; Vartiainen, Ismo; Rösner, Benedikt Scientific Reports, Vol. 7, Issue 1 https://doi.org/10.1038/srep43624	journal	March 2017
Multilayer Laue Lens: A Brief History and Current Status Conley, Ray; Bouet, Nathalie; Chu, Yong S. Synchrotron Radiation News, Vol. 29, Issue 4 https://doi.org/10.1080/08940886.2016.1198669	journal	July 2016
Point focusing with flat and wedged crossed multilayer Laue lenses Kubec, Adam; Melzer, Kathleen; Gluch, Jürgen Journal of Synchrotron Radiation, Vol. 24, Issue 2 https://doi.org/10.1107/s1600577517001722	journal	February 2017
Achieving diffraction-limited nanometer-scale X-ray point focus with two crossed multilayer Laue lenses: alignment challenges Yan, Hanfei; Huang, Xiaojing; Bouet, Nathalie Optics Express, Vol. 25, Issue 21 https://doi.org/10.1364/oe.25.025234	journal	January 2017

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