Atomic Layer Deposition of L-Alanine Polypeptide

Fu, Yaqin; Li, Binsong; Jiang, Ying-Bing; Dunphy, Darren R.; Tsai, Andy; Tam, Siu-Yue; Fan, Hongyou Y.; Zhang, Hongxia; Rogers, David; Rempe, Susan; Atanassov, Plamen; Cecchi, Joseph L.; Brinker, C. Jeffrey

doi:10.1021/ja5043403

Atomic Layer Deposition of L-Alanine Polypeptide

Journal Article · Thu Oct 30 00:00:00 EDT 2014 · Journal of the American Chemical Society

DOI:https://doi.org/10.1021/ja5043403· OSTI ID:1237464

Fu, Yaqin ^[1]; Li, Binsong ^[2]; Jiang, Ying-Bing ^[1]; Dunphy, Darren R. ^[1]; Tsai, Andy ^[3]; Tam, Siu-Yue ^[3]; Fan, Hongyou Y. ^[2]; Zhang, Hongxia ^[4]; Rogers, David ^[2]; Rempe, Susan ^[2]; Atanassov, Plamen ^[1]; Cecchi, Joseph L. ^[1]; Brinker, C. Jeffrey ^[5]

Univ. of New Mexico, Albuquerque, NM (United States)
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
T3 Scientific LLC, Blaine, MN (United States)
Angstrom Thin Film Technologies LLC, Albuquerque, NM (United States)
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Univ. of New Mexico, Albuquerque, NM (United States)

L-Alanine polypeptide thin films were synthesized via atomic layer deposition (ALD). Rather, instead of using an amino acid monomer as the precursor, an L-alanine amino acid derivatized with a protecting group was used to prevent self-polymerization, increase the vapor pressure, and allow linear cycle-by-cycle growth emblematic of ALD. Moreover, the successful deposition of a conformal polypeptide film has been confirmed by FTIR, TEM, and Mass Spectrometry, and the ALD process has been extended to polyvaline.

View Accepted Manuscript (DOE)

Research Organization:: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: AC04-94AL85000

OSTI ID:: 1237464

Report Number(s):: SAND--2015-1894J; 579539

Journal Information:: Journal of the American Chemical Society, Journal Name: Journal of the American Chemical Society Journal Issue: 45 Vol. 136; ISSN 0002-7863

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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