Nucleation of fcc Ta when heating thin films

Janish, Matthew T.; Mook, William M.; Carter, C. Barry

doi:10.1016/j.scriptamat.2014.10.010

Nucleation of fcc Ta when heating thin films

Journal Article · Sat Oct 25 00:00:00 EDT 2014 · Scripta Materialia

DOI:https://doi.org/10.1016/j.scriptamat.2014.10.010· OSTI ID:1235331

Janish, Matthew T. ^[1]; Mook, William M. ^[2]; Carter, C. Barry ^[3]

Univ. of Connecticut, Storrs, CT (United States)
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Univ. of Connecticut, Storrs, CT (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Thin tantalum films have been studied during in-situ heating in a transmission electron microscope. Diffraction patterns from the as-deposited films were typical of amorphous materials. Crystalline grains were observed to form when the specimen was annealed in-situ at 450°C. Particular attention was addressed to the formation and growth of grains with the face-centered cubic (fcc) crystal structure. As a result, these observations are discussed in relation to prior work on the formation of fcc Ta by deformation and during thin film deposition.

View Accepted Manuscript (DOE)

Research Organization:: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: AC04-94AL85000

OSTI ID:: 1235331

Alternate ID(s):: OSTI ID: 22441579
OSTI ID: 1432395

Report Number(s):: SAND--2014-16009J; PII: S1359646214004102

Journal Information:: Scripta Materialia, Journal Name: Scripta Materialia Journal Issue: C Vol. 96; ISSN 1359-6462

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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36 MATERIALS SCIENCE
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high-resolution electron microscopy (HREM)
tantalum
transmission electron microscopy (TEM)

Nucleation of fcc Ta when heating thin films

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