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Structures with fcc cells in thin films of oxides of Ta and Nb

Journal Article · · Sov. Phys. - Crystallogr. (Engl. Transl.); (United States)
OSTI ID:5623813
Annealing of thin films of tantalum and niobium in oxygen and in a vacuum of 10/sup -3/ mm at 700--750 and 500--550 deg C gives oxides with the periods a/sub Ta/=5.10 A, a/sub Nb/=5.11 A. The oxide of tantalum has a metallic framework with cubic close packing, in which the octahedral pores are filled with oxygen with a probability of about 50%, and near the tantalum atoms there are additional interstitial oxygen atoms on the lines of the Me--Me bonds with a Ta--O distance of 1.81 A (with probability 10--15%).
Research Organization:
Institute of Crystallography of the Academy of Sciences of the USSR
OSTI ID:
5623813
Journal Information:
Sov. Phys. - Crystallogr. (Engl. Transl.); (United States), Journal Name: Sov. Phys. - Crystallogr. (Engl. Transl.); (United States) Vol. 24:6; ISSN SPHCA
Country of Publication:
United States
Language:
English