Bias sputter deposition of dense yttria-stabilized zirconia films on porous substrates
- Northwestern Univ., Evanston, IL (United States). Dept. of Materials Science and Engineering
The authors demonstrate that completely dense yttria-stabilized zirconia (YSZ) electrolyte films <5 {micro}m thick can be reactively sputter deposited onto porous ({approximately}0.5 {micro}m pore size) La{sub 0.8}Sr{sub 0.2}MnO{sub 3} substrate/electrodes. The two key factors in achieving the fully dense films were porous substrate preparation and the use of substrate bias during YSZ film deposition. Increasing the negative dc substrate bias V{sub s} from 0 to 300 V produced increasingly dense and flat-surfaced films: V{sub s} = 75 V was chosen to yield high density without excessive film compressive stresses. Solid oxide fuel cells consisting of sputtered YSZ films (V{sub s} = 75 V) and a Ni-YSZ fuel electrode on LSM exhibited open-circuit voltage values within 5% of the theoretical values for thicknesses down to 2 {micro}m. Cells deposited with V{sub s} = 0 V short-circuited at thicknesses of 12 {micro}m or less.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 122740
- Journal Information:
- Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 9 Vol. 142; ISSN 0013-4651; ISSN JESOAN
- Country of Publication:
- United States
- Language:
- English
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