Phase Separation and Facet Formation during the Growth of (GaAs)1-x(Ge2)x Alloy Layers by Metal Organic Vapour Phase Epitaxy
Conference
·
OSTI ID:12158
- National Renewable Energy Laboratory
- Spire Corporation
Metal organic vapour phase epitaxy (GaAs)1-x(Ge2)x alloy layers, 0<x<0.22, were grown at temperatures between 640 and 690 C, on vicinal (001) GaAs substrates. Phase separation occurred in all the layers. The phase-separated microstructure changed with alloy composition, growth temperature, and substrate orientation. In x {approx} 0.1 layers grown at 640 C, Ge segregation occurred on {l_brace}115{r_brace}B planes associated with a {l_brace}115{r_brace}B surface faceting. Increase in growth temperature led to the formation of large, (001)-oriented, irregular-shaped platelets of Ge-rich material. Growth on {l_brace}115{r_brace}B substrates resulted in a ''natural superlattice'' of GaAs/Ge along the growth direction.
- Research Organization:
- National Renewable Energy Lab., Golden, CO (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC36-99GO10337;
- OSTI ID:
- 12158
- Report Number(s):
- NREL/CP-520-26319
- Resource Type:
- Conference paper/presentation
- Conference Information:
- Microscopy of Semiconducting Materials XI, Oxford (GB), 03/22/1999--03/25/1999
- Country of Publication:
- United States
- Language:
- English
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