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Title: Lattice matched GaAs/Sc{sub 0.3}Er{sub 0.7}As/GaAs heterostructures grown on various substrate orientations

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.359455· OSTI ID:29261
 [1];  [2];  [3]
  1. Oak Ridge National Laboratory, Solid State Division, P.O. Box 2008, Oak Ridge, Tennessee 37831-6057 (United States)
  2. Bellcore, 331 Newman Springs Road, Red Bank, New Jersey 07701 (United States)
  3. Department of Chemical Engineering and Materials Science, Amundson Hall, 421 Washington Avenue, SE, University of Minnesota, Minneapolis, Minnesota 55455 (United States)

Lattice-matched heterostructures of GaAs/Sc{sub 0.3}Er{sub 0.7}As/GaAs have been grown on GaAs substrates with various orientations by molecular beam epitaxy and characterized by transmission electron microscopy. The Sc{sub 0.3}Er{sub 0.7}As layer usually has good epitaxy on GaAs; the purpose of this study is to investigate the overgrowth of GaAs on Sc{sub 0.3}Er{sub 0.7}As. In comparison with the samples grown on nominal (100) substrates, the epitactic growth of GaAs on Sc{sub 0.3}Er{sub 0.7}As is slightly improved on a vicinal substrate oriented (100) 6{degree} off towards (111){ital A}. {l_brace}311{r_brace} and {l_brace}211{r_brace} are shown to be preferred orientations for the epitactic growth of GaAs/Sc{sub 0.3}Er{sub 0.7}As/GaAs heterostructures. The epilayers grown on {l_brace}311{r_brace} and {l_brace}211{r_brace} substrates are epitactically well aligned, and the density of planar defects (stacking faults and microtwins) in the overgrown GaAs layer is significantly reduced. It is suggested that the mixed {l_brace}111{r_brace} and {l_brace}100{r_brace} character surfaces assist the nucleation of GaAs on Sc{sub 0.3}Er{sub 0.7}As. Stacking faults and microtwins are the major defects for the epilayers grown on (110) substrates. For samples grown on (111){ital B}-oriented substrates, twinning at the interfaces occurs frequently even when selftwinning inside each material is eliminated.

OSTI ID:
29261
Journal Information:
Journal of Applied Physics, Vol. 77, Issue 9; Other Information: PBD: 1 May 1995
Country of Publication:
United States
Language:
English