Two-dimensional simulation of inductive plasma sources with self-consistent power deposition
Journal Article
·
· IEEE Transactions on Plasma Science
OSTI ID:118900
- Chinese Academy of Sciences, Beijing (China). Institute of Mechanics
A time averaged two-dimensional fluid model including an electromagnetic module with self-consistent power deposition was developed to simulate the transport of a low pressure radio frequency inductively coupled plasma source. Comparisons with experiment and previous simulation results show that the fluid model is feasible in a certain range of gas pressure. In addition, the effects of gas pressure and power input have been discussed. These high density plasma sources can supply high ion fluxes to surfaces in etching or film deposition processes at low neutral gas pressure (1--20 mTorr), with controllable and directional ion energy.
- OSTI ID:
- 118900
- Journal Information:
- IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 4 Vol. 23; ISSN ITPSBD; ISSN 0093-3813
- Country of Publication:
- United States
- Language:
- English
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