Two-dimensional modeling of high plasma density inductively coupled sources for materials processing
Journal Article
·
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
- Department of Electrical and Computer Engineering, University of Illinois, Urbana, Illinois 61801 (United States)
Inductively coupled plasma sources are being developed to address the need for high plasma density (10[sup 11]--10[sup 12] cm[sup [minus]3]), low pressure (a few to 10--20 mTorr) etching of semiconductor materials. One such device uses a flat spiral coil of rectangular cross section to generate radio-frequency (rf) electric fields in a cylindrical plasma chamber, and capacitive rf biasing on the substrate to independently control ion energies incident on the wafer. To investigate these devices we have developed a two-dimensional hybrid model consisting of electromagnetic, electron Monte Carlo, and hydrodynamic modules; and an off line plasma chemistry Monte Carlo simulation. The results from the model for plasma densities, plasma potentials, and ion fluxes for Ar, O[sub 2], Ar/CF[sub 4]/O[sub 2] gas mixtures will be presented.
- OSTI ID:
- 5254060
- Journal Information:
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) Vol. 12:1; ISSN JVTBD9; ISSN 0734-211X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700390* -- Other Plasma Physics Studies-- (1992-)
ARGON
CARBON TETRAFLUORIDE
ELECTRIC DISCHARGES
ELECTRIC POTENTIAL
ELEMENTS
ETCHING
FLUIDS
FLUORINATED ALIPHATIC HYDROCARBONS
GASES
HALOGENATED ALIPHATIC HYDROCARBONS
HIGH-FREQUENCY DISCHARGES
MATHEMATICAL MODELS
NONMETALS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
OXYGEN
PLASMA DENSITY
PLASMA POTENTIAL
RARE GASES
SURFACE FINISHING
TWO-DIMENSIONAL CALCULATIONS
USES
700390* -- Other Plasma Physics Studies-- (1992-)
ARGON
CARBON TETRAFLUORIDE
ELECTRIC DISCHARGES
ELECTRIC POTENTIAL
ELEMENTS
ETCHING
FLUIDS
FLUORINATED ALIPHATIC HYDROCARBONS
GASES
HALOGENATED ALIPHATIC HYDROCARBONS
HIGH-FREQUENCY DISCHARGES
MATHEMATICAL MODELS
NONMETALS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
OXYGEN
PLASMA DENSITY
PLASMA POTENTIAL
RARE GASES
SURFACE FINISHING
TWO-DIMENSIONAL CALCULATIONS
USES