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Distributed bragg reflector using AIGaN/GaN

Patent ·
OSTI ID:1174984

A supported distributed Bragg reflector or superlattice structure formed from a substrate, a nucleation layer deposited on the substrate, and an interlayer deposited on the nucleation layer, followed by deposition of (Al,Ga,B)N layers or multiple pairs of (Al,Ga,B)N/(Al,Ga,B)N layers, where the interlayer is a material selected from AlN, Al.sub.x Ga.sub.1-x N, and AlBN with a thickness of approximately 20 to 1000 angstroms. The interlayer functions to reduce or eliminate the initial tensile growth stress, thereby reducing cracking in the structure. Multiple interlayers utilized in an AlGaN/GaN DBR structure can eliminate cracking and produce a structure with a reflectivity value greater than 0.99.

Research Organization:
Sandia National Laboratories (SNL-CA), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
6,775,314
Application Number:
09/998,114
OSTI ID:
1174984
Country of Publication:
United States
Language:
English

References (8)

Stress engineering during metalorganic chemical vapor deposition of AlGaN/GaN distributed Bragg reflectors journal May 2001
High reflectivity and broad bandwidth AlN/GaN distributed Bragg reflectors grown by molecular-beam epitaxy journal May 2000
Near ultraviolet optically pumped vertical cavity laser journal January 2000
Study of high quality GaN grown by OMVPE using an intermediate layer journal September 2000
Highly reflective GaN/Al0.34Ga0.66N quarter-wave reflectors grown by metal organic chemical vapor deposition journal December 1998
High-reflectivity GaN/GaAlN Bragg mirrors at blue/green wavelengths grown by molecular beam epitaxy journal June 1999
Room-temperature photopumped InGaN/GaN/AlGaN vertical-cavity surface-emitting laser journal August 1999
Improvement of Crystalline Quality of Group III Nitrides on Sapphire Using Low Temperature Interlayers journal January 1999

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