Fabrication of submicron metallic grids with interference and phase-mask holography

Journal Article · Tue Jan 25 00:00:00 EST 2011 · Journal of Micro/Nanolithography, MEMS, and MOEMS

OSTI ID:1025011

Park, Joong-Mok; Kim, Tae-Geun; Constant, Kristen; Ho, Kai-Ming

Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6%) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

• Research Organization: Ames Lab., Ames, IA (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC02-07CH11358
• OSTI ID: 1025011
• Report Number(s): IS-J 7590; TRN: US201120%%295
• Journal Information: Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, Issue 1
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
36 MATERIALS SCIENCE
DEPOSITION
ELECTRODEPOSITION
ELECTRODES
FABRICATION
HOLOGRAPHY
NANOSTRUCTURES
POLYMERS