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Spatially Resolved Luminescence Spectroscopy on Multicrystalline Silicon

Conference ·
OSTI ID:1022384
Luminescence spectroscopy is applied to multicrystalline p-type silicon. Photoluminescence spectroscopy, cathodoluminescence spectrum imaging, and defect luminescence imaging are used for the characterization at temperatures from 21 K to 300 K. A defect line, persistent up to ambient temperature, was found in the photoluminescence spectrum of highly defective areas of the silicon samples under test. The line was associated with the dislocation characteristic emission and identified as the D2' band. Temperature dependent analysis of the peak position and peak intensity together with the application of a theoretical description of the thermal deactivation process of the luminescence transitions are used to estimate the energy positions of the involved defects.
Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO.
Sponsoring Organization:
USDOE Office of Solar Energy Technologies Program
DOE Contract Number:
AC36-08GO28308
OSTI ID:
1022384
Country of Publication:
United States
Language:
English

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