Chemometric analysis of IR external reflection spectra for quantitative determination of BPSG thin films

Conference · Sun Oct 31 23:00:00 EST 1993

OSTI ID:10194008

Niemczyk, T M; Zhang, L; Franke, J E ^[1]; Haaland, D M ^[2]; Radigan, K ^[3]

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1. New Mexico Univ., Albuquerque, NM (United States). Dept. of Chemistry
2. Sandia National Labs., Albuquerque, NM (United States)
3. National Semiconductor, Santa Clara, CA (United States)

Infrared (IR) reflection spectroscopy has been shown to be useful for making rapid and nondestructive quantitative determinations of B and P contents and film thickness for borophosphosilicate glass (BPSG) thin films on silicon monitor wafers. Preliminary data also show that similarly precise determinations can be made for BPSG films on device wafers.

• Research Organization: Sandia National Labs., Albuquerque, NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-94AL85000; AC04-76DP00789
• OSTI ID: 10194008
• Report Number(s): SAND--93-2119C; CONF-9309208--3; ON: DE94002744; BR: GB0103012
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102
42 ENGINEERING
426000
BORON
BORON SILICATES
CHEMICAL AND SPECTRAL PROCEDURES
COMPONENTS
ELECTRON DEVICES AND CIRCUITS
GLASS
INFRARED SPECTRA
PHOSPHORUS
PHOSPHORUS COMPOUNDS
REFLECTION
SEMICONDUCTOR DEVICES
SILICON
SPECTROSCOPY
THIN FILMS