Determination of BPSG thin-film properties using IR reflection spectroscopy of product wafers
- Univ. of New Mexico, Albuquerque, NM (United States). Chemistry Dept.
- Sandia National Labs., Albuquerque, NM (United States)
- National Semiconductor, Santa Clara, CA (United States)
Borophosphosilicate glass (BPSG) thin films are widely used in the microelectronics industry as passivation layers, planarization layers, low-fusion-temperature dielectrics, etc. Currently available analytical methods for determining boron and phosphorus content in BPSG films do not meet the demands of at-line or in-situ quality control process monitoring. Infrared (IR) spectroscopy satisfies many of the at-line or in-situ issues, but has only recently been capable of providing quantitative results using undoped and unpatterned silicon substrates. Three BPSG calibration sets were analyzed using infrared external reflection-absorption spectroscopy: (1) 21 films deposited on undoped silicon coated with 0.1 {mu}m of silicon dioxide, (2) 21 films deposited on undoped silicon, and (3) 9 films deposited on microelectronics product wafers. A multivariate partial least squares analysis of the spectral data for the first large data set showed that boron content, phosphorus content, and film thickness can be quantified with precisions of 0.10 wt%, 0.12 wt%, and 30 {angstrom}, respectively. The second large data set yielded similar results. The precisions obtained for the nine product wafer samples were 0.13 wt%B, 0.09 wt%P, and for film thickness 103 {angstrom}.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 10122515
- Report Number(s):
- SAND-93-1635C; CONF-931108-77; ON: DE94006591; BR: GB0103012; TRN: AHC29405%%2
- Resource Relation:
- Conference: Fall meeting of the Materials Research Society (MRS),Boston, MA (United States),29 Nov - 3 Dec 1993; Other Information: PBD: [1993]
- Country of Publication:
- United States
- Language:
- English
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