Chemometric analysis of infrared emission spectra for quantitative analysis of BPSG films on silicon
Conference
·
OSTI ID:10104414
- New Mexico Univ., Albuquerque, NM (United States). Dept. of Chemistry
- Sandia National Labs., Albuquerque, NM (United States)
Infrared emission spectra of 21 borophosphosilicate glass (BPSG) thin films on silicon wafers were collected with the samples held at constant temperature between 125--400{degree}C using a heating stage designed for precise temperature control ({plus_minus}{degree}C). Partial test squares calibrations applied to the BPSG infrared emittance spectra allowed four BPSG thin-film properties to be simultaneously quantified with precisions of 0.1 wt. % for boron and phosphorus, 35 {Angstrom} for film thickness, and 1.2{degree}C for temperature.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 10104414
- Report Number(s):
- SAND--93-2117C; CONF-9309208--2; ON: DE94002743; BR: GB0103012
- Country of Publication:
- United States
- Language:
- English
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