Diffusion-induced grain boundary migration during ion beam mixing of Au/Cu bilayers

Conference · Tue Sep 01 00:00:00 EDT 1992

OSTI ID:10183338

Alexander, D E; Baldo, P M; Rehn, L E

Experiments were performed to evaluate the effect of 1.5 MeV Kr irradiation on diffusion-induced grain boundary migration (DIGM) in Au/Cu bilayers in the temperature range of 300{le}T{le}050K. The experimental results were consistent with DIGM occurring in bilayers both during irradiation and during annealing treatments. Rutherford backscattering spectrometry showed a nearly uniform distribution of Cu present through the entire thickness of appropriately prepared polycrystalline Au films irradiated or annealed at temperatures {ge}400K. No parallel effect was seen in similarly treated single-crystal films. In each polycrystalline sample studied, irradiation resulted in greater amounts of Cu present uniformly in the Au compared to annealing-only. The magnitudes of measured Cu compositions were substantially greater than that expected solely from grain boundary diffusion. A simple analysis of the process indicated that ion irradiation affects DIGM by increasing the composition of Cu present in alloyed zones and/or by increasing the grain boundary velocity in the Au.

• Research Organization: Argonne National Lab., IL (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-31109-ENG-38
• OSTI ID: 10183338
• Report Number(s): ANL/CP-76009; CONF-9209200-4; ON: DE93000508
• Resource Relation: Conference: 8. international conference on ion beam modification of materials,Heidelberg (Germany),7-11 Sep 1992; Other Information: PBD: Sep 1992
• Country of Publication: United States
• Language: English

Related Subjects

07 ISOTOPES AND RADIATION SOURCES
36 MATERIALS SCIENCE
GOLD
MIXING
RADIATION EFFECTS
COPPER
ION BEAMS
KRYPTON IONS
MEV RANGE 01-10
LAYERS
GRAIN BOUNDARIES
TEMPERATURE RANGE 0273-0400 K
TEMPERATURE RANGE 0400-1000 K
RUTHERFORD SCATTERING
BACKSCATTERING
POLYCRYSTALS
FILMS
ANNEALING
DIFFUSION
THICKNESS
070205
360106
INDUSTRIAL APPLICATIONS
RADIATION PROCESSING