Time-of-flight heavy ion backscattering spectrometry

Conference · Sun Aug 01 00:00:00 EDT 1993

OSTI ID:10183061

Knapp, J A; Banks, J C; Doyle, B L

A new time-of-flight (TOF) ion detection system for Heavy Ion Backscattering Spectrometry (HIBS) is described. Examples are also given of the use of the system for measuring low-level contamination on Si wafers. Currently, the TOF-HBIS system has a sensitivity of 1 {times} 10{sup 9}/cm{sup 2} for the heaviest of surface impurity atoms and a mass resolution capable of separating Fe from Cu. The sensitivity is expected to improve by an additional order of magnitude on a industrial TOF-HIBS system being constructed for SEMATECH.

• Research Organization: Sandia National Labs., Albuquerque, NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 10183061
• Report Number(s): SAND--93-0785C; CONF-930709--1; ON: DE93019067
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102
42 ENGINEERING
426000
664200
74 ATOMIC AND MOLECULAR PHYSICS
BACKSCATTERING
CHEMICAL AND SPECTRAL PROCEDURES
COMPONENTS
ELECTRON DEVICES AND CIRCUITS
COPPER
DEPLETION LAYER
HEAVY IONS
INTEGRATED CIRCUITS
ION DETECTION
ION SPECTROSCOPY
IRON
LEAD
SILICON
SPECTRA OF ATOMS AND MOLECULES AND THEIR INTERACTIONS WITH PHOTONS
TIME-OF-FLIGHT METHOD