Characterization of Etch Pit Formation via the Everson-Etching Method on CdZnTe Crystal Surfaces from the Bulk to the Nano-Scale

Journal Article · Fri Sep 24 00:00:00 EDT 2010 · Nuclear Instruments and Methods in Physics Research

OSTI ID:1016392

A combination of atomic force microscopy, optical microscopy, and mass spectrometry was employed to study CdZnTe crystal surface and used etchant solution following exposure of the CdZnTe crystal to the Everson etch solution. We discuss the results of these studies in relationship to the initial surface preparation methods, the performance of the crystals as radiation spectrometers, the observed etch pit densities, and the chemical mechanism of surface etching. Our results show that the surface features that are exposed to etchants result from interactions with the chemical components of the etchants as well as pre-existing mechanical polishing.

• Research Organization: Savannah River Site (SRS), Aiken, SC (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: DE-AC09-08SR22470
• OSTI ID: 1016392
• Report Number(s): SRNL-STI-2010-00578; NIMRD9; TRN: US1103128
• Journal Information: Nuclear Instruments and Methods in Physics Research, Journal Name: Nuclear Instruments and Methods in Physics Research; ISSN 0167-5087
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ATOMIC FORCE MICROSCOPY
ETCHING
MASS SPECTROSCOPY
MECHANICAL POLISHING
OPTICAL MICROSCOPY
PERFORMANCE
RADIATIONS
SPECTROMETERS