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Characterization of Etch Pit Formation via the Everson-Etching Method on CdZnTe Crystal Surfaces from the Bulk to the Nano-Scale

Journal Article · · Nuclear Instruments and Methods in Physics Research
OSTI ID:1016392
A combination of atomic force microscopy, optical microscopy, and mass spectrometry was employed to study CdZnTe crystal surface and used etchant solution following exposure of the CdZnTe crystal to the Everson etch solution. We discuss the results of these studies in relationship to the initial surface preparation methods, the performance of the crystals as radiation spectrometers, the observed etch pit densities, and the chemical mechanism of surface etching. Our results show that the surface features that are exposed to etchants result from interactions with the chemical components of the etchants as well as pre-existing mechanical polishing.
Research Organization:
Savannah River Site (SRS), Aiken, SC (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC09-08SR22470
OSTI ID:
1016392
Report Number(s):
SRNL-STI-2010-00578
Journal Information:
Nuclear Instruments and Methods in Physics Research, Journal Name: Nuclear Instruments and Methods in Physics Research; ISSN NIMRD9; ISSN 0167-5087
Country of Publication:
United States
Language:
English

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