Effect of temperature on the electron attachment and detachment properties of c-C{sub 4}F{sub 6}
- Oak Ridge National Lab., TN (United States)
The temperature dependence of the low-energy electron attachment and autodetachment processes for c-C{sub 4}F{sub 6} in a N{sub 2} buffer gas has been studied in the temperature, T, range of 300 to 600 K and the mean electron energy, <{epsilon}>, range from 0.19 to 1.0 eV. The low-energy electron attachment rate constant for c-C{sub 4}F{sub 6} shows only a slight dependence on gas temperature. In contrast, the autodetachment frequency increases by more than four orders of magnitude when T is increased from 300 to 600 K. This increase in autodetachment is due to the increase in the internal energy content of the c-C{sub 4},F{sub 6}{sup {minus}} anion with increasing T. The autodetachment process under consideration is a heat-activated process and has an activation energy E* of 0.24 eV. Significance of these results to gaseous dielectrics is indicated.
- Research Organization:
- Oak Ridge National Lab., TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 10155347
- Report Number(s):
- CONF-940414--1; ON: DE94012750; CNN: Contract AF 33615-02-C-2221
- Country of Publication:
- United States
- Language:
- English
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