Attachment of low energy electrons to ``hot`` SF{sub 6} molecules

Conference · Wed Jun 01 04:00:00 EDT 1994

OSTI ID:10155767

Datskos, P G; Cristophorou, L G ^[1]; Carter, J G ^[1]

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1. Oak Ridge National Lab., TN (United States)

The low energy electron attachment rate constant, k{sub a}, for SF{sub 6} has measured in dilute mixtures of SF{sub 6} with N{sub 2} buffer gas in the temperature, T, range of 300 to 500 K and over a range of E/N values corresponding to mean electron energies, < {epsilon} >, ranging from 0.19 to 1.0 eV. As the gas temperature increases, the magnitude and energy dependence of k{sub a} (< {epsilon} >, T) remain unaffected. In the same T-range the collisionally stabilized SF{sub 6}{sup {minus}} is very stable with respect to autodetachment; its lifetime is > 1ms. The limiting electric field strength (E/N){sub lim} for SF{sub 6} was found to increase by {approximately}14% as T is raised from 300 to 600 K. The significance of these finding in gaseous dielectrics is indicated.

• Research Organization: Oak Ridge National Lab., TN (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States)
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 10155767
• Report Number(s): CONF-940414--2; ON: DE94012749; CNN: Contract AF33615-92-C-2221
• Country of Publication: United States
• Language: English

Related Subjects

664400
74 ATOMIC AND MOLECULAR PHYSICS
CROSS SECTIONS
ELECTRON ATTACHMENT
ENERGY DEPENDENCE
EXPERIMENTALLY DERIVED INFORMATION ON ATOMIC AND MOLECULAR PROPERTIES
SULFUR FLUORIDES
TEMPERATURE DEPENDENCE