Discharge Physics of High Power Impulse Magnetron Sputtering

Journal Article · Wed Oct 13 04:00:00 EDT 2010 · Surface and Coatings Technology

OSTI ID:1015328

Anders, Andre

High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of ?gasless? self-sputtering.

• Research Organization: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
• Sponsoring Organization: Accelerator& Fusion Research Division
• DOE Contract Number: AC02-05CH11231
• OSTI ID: 1015328
• Report Number(s): LBNL-4153E
• Journal Information: Surface and Coatings Technology, Journal Name: Surface and Coatings Technology; ISSN 0257-8972; ISSN SCTEEJ
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ARGON
ATOMS
IONIZATION
KRYPTON
MAGNETRONS
NIOBIUM
PEAK LOAD
PHYSICS
PLASMA
SPUTTERING
TARGETS
high power impulse magnetron sputtering
discharge
plasma