Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

Anders, André

doi:10.1063/1.4978350

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

Journal Article · Tue Mar 21 04:00:00 EDT 2017 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4978350· OSTI ID:1379841

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Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. Furthermore, by applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to conventional magnetron sputtering, HiPIMS is characterized by self-sputtering or repeated gas recycling for high and low sputter yield materials, respectively, and both for most intermediate materials. The dense plasma in front of the target has the dual function of sustaining the discharge and providing plasma-assistance to film growth, affecting the microstructure of growing films. Many technologically interesting thin films are compound films, which are composed of one or more metals and a reactive gas, most often oxygen or nitrogen. When reactive gas is added, non-trivial consequences arise for the system because the target may become “poisoned,” i.e., a compound layer forms on the target surface affecting the sputtering yield and the yield of secondary electron emission and thereby all other parameters. It is emphasized that the target state depends not only on the reactive gas' partial pressure (balanced via gas flow and pumping) but also on the ion flux to the target, which can be controlled by pulse parameters. This is a critical technological opportunity for reactive HiPIMS (R-HiPIMS). The scope of this tutorial is focused on plasma processes and mechanisms of operation and only briefly touches upon film properties. It introduces R-HiPIMS in a systematic, step-by-step approach by covering sputtering, magnetron sputtering, reactive magnetron sputtering, pulsed reactive magnetron sputtering, HiPIMS, and finally R-HiPIMS. The tutorial is concluded by considering variations of R-HiPIMS known as modulated pulsed power magnetron sputtering and deep-oscillation magnetron sputtering and combinations of R-HiPIMS with superimposed dc magnetron sputtering.

View Accepted Manuscript (DOE)

Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1379841

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 17 Vol. 121; ISSN JAPIAU; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Reactive sputtering of δ-ZrH ₂ thin films by high power impulse magnetron sputtering and direct current magnetron sputtering Högberg, Hans; Tengdelius, Lina; Samuelsson, Mattias Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 32, Issue 4 https://doi.org/10.1116/1.4882859	journal	July 2014
High power pulsed magnetron sputtering: A method to increase deposition rate Raman, Priya; Shchelkanov, Ivan A.; McLain, Jake Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 3 https://doi.org/10.1116/1.4916108	journal	May 2015
Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursor Hänninen, Tuomas; Schmidt, Susann; Jensen, Jens Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 5 https://doi.org/10.1116/1.4927493	journal	September 2015
Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique Purandare, Yashodhan P.; Ehiasarian, Arutiun P.; Eh Hovsepian, Papken Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 4 https://doi.org/10.1116/1.4950886	journal	July 2016
Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering Lundin, Daniel; Čada, Martin; Hubička, Zdenĕk Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 4 https://doi.org/10.1116/1.4953033	journal	July 2016
Synthesis of hydrogenated diamondlike carbon thin films using neon–acetylene based high power impulse magnetron sputtering discharges Aijaz, Asim; Louring, Sascha; Lundin, Daniel Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 6 https://doi.org/10.1116/1.4964749	journal	November 2016
Self‐sputtering phenomena in high‐rate coaxial cylindrical magnetron sputtering Hosokawa, N.; Tsukada, T.; Misumi, T. Journal of Vacuum Science and Technology, Vol. 14, Issue 1 https://doi.org/10.1116/1.569107	journal	January 1977
Magnetron sputtering: basic physics and application to cylindrical magnetrons Thornton, John A. Journal of Vacuum Science and Technology, Vol. 15, Issue 2 https://doi.org/10.1116/1.569448	journal	March 1978
A sputtering wind Hoffman, D. W. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 3, Issue 3 https://doi.org/10.1116/1.572994	journal	May 1985
Charged particle fluxes from planar magnetron sputtering sources Window, B.; Savvides, N. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 4, Issue 2 https://doi.org/10.1116/1.573470	journal	March 1986
Unbalanced dc magnetrons as sources of high ion fluxes Window, B.; Savvides, N. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 4, Issue 3 https://doi.org/10.1116/1.573904	journal	May 1986
Modeling of reactive sputtering of compound materials Berg, S.; Blom, H‐O.; Larsson, T. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 5, Issue 2, p. 202-207 https://doi.org/10.1116/1.574104	journal	March 1987
Gas density reduction effects in magnetrons Rossnagel, S. M. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 6, Issue 1 https://doi.org/10.1116/1.574988	journal	January 1988
Spatially averaged (global) model of time modulated high density argon plasmas Ashida, Sumio; Lee, C.; Lieberman, M. A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 13, Issue 5 https://doi.org/10.1116/1.579494	journal	September 1995
Optical studies of plasma inhomogeneities in a high-current pulsed magnetron discharge Kozyrev, A. V.; Sochugov, N. S.; Oskomov, K. V. Plasma Physics Reports, Vol. 37, Issue 7 https://doi.org/10.1134/S1063780X11060122	journal	July 2011
High Efficiency Copper Indium Gallium DiSelenide (CIGS) by High Power Impulse Magnetron Sputtering (HIPIMS): A Promising and Scalable Application in Thin-film Photovoltaics Halbe, Ankush; Johnson, Paul; Jackson, Shen MRS Proceedings, Vol. 1210 https://doi.org/10.1557/PROC-1210-Q06-09	journal	January 2009
Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering Andersson, Joakim; Ni, Pavel; Anders, André arXiv https://doi.org/10.48550/arxiv.1402.2921	text	January 2014
Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride Shimizu, T.; Villamayor, M.; Lundin, D. arXiv https://doi.org/10.48550/arxiv.1509.07002	text	January 2015

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