Fundamental studies of defect generation in amorphous silicon alloys grown by remote plasma-enhanced chemical-vapor deposition (Remote PECVD). Annual subcontract report, 1 September 1990--31 August 1991
- North Carolina State Univ., Raleigh, NC (United States)
We demonstrated that the remote PECVD process can be used to deposit heavily doped n-type and p-type a-Si:H thin films. We optimized conditions for depositing undoped, near-intrinsic and heavily doped thin films of {mu}c(microcrystalline)-Si by remote PECVD. We extended the remote PECVD process to the deposition of undoped and doped a-Si,C:H and {mu}c-Si,C alloy films. We analyzed transport data for the dark conductivity in undoped and doped a-Si:H, a-Si,C:H, {mu}c-Si and {mu}c-Si,C films. We studied the properties of doped a-Si:H and {mu}c-Si in MOS capacitors using {approximately}10 {Omega}-cm p-type crystalline substrates and thermally grown Si0{sub 2} dielectric layers. We collaborated with a group at RWTH in Aachen, Germany, and studied the contributions of process induced defect states to the recombination of photogenerated electron pairs. We applied a tight-binding model to Si-Bethe lattice structures to investigate the effects of bond angle, and dihedral angle disorder. We used ab initio and empirical calculations to study non-random bonding arrangements in a-Si,O:H and doped a-Si:H films.
- Research Organization:
- National Renewable Energy Lab., Golden, CO (United States); North Carolina State Univ., Raleigh, NC (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC02-83CH10093
- OSTI ID:
- 10129188
- Report Number(s):
- NREL/TP--451-4852; ON: DE92010560
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
140501
36 MATERIALS SCIENCE
360601
AMORPHOUS STATE
BORON ADDITIONS
CAPACITORS
CARBON ADDITIONS
CHEMICAL VAPOR DEPOSITION
CRYSTAL DEFECTS
DOPED MATERIALS
ELECTRICAL PROPERTIES
HYDROGEN ADDITIONS
MOLECULAR STRUCTURE
MOS SOLAR CELLS
N-TYPE CONDUCTORS
P-TYPE CONDUCTORS
PHOTOVOLTAIC CONVERSION
PLASMA
PREPARATION AND MANUFACTURE
PROGRESS REPORT
SILICON
THIN FILMS