The diffusion properties of ion implanted species in selected target materials
- Oak Ridge National Lab., TN (United States)
Experiments important to the future success of the Holifield Radioactive Ion Beam Facility (HRIBF) are in progress at the Oak Ridge National Laboratory which are designed to select the most appropriate target material for generating a particular radioactive ion beam (RIB). The 25-MV HHIRF tandem accelerator is used to implant stable complements of interesting radioactive elements into refractory targets mounted in a high-temperature FEBIAD ion source which is {open_quotes}on-line{close_quotes} at the UNISOR facility. The intensity versus time of implanted species, which diffuse from the high-temperature target material ({approximately}1700{degrees}C) and are ionized in the FEBIAD ion source, is used to determine release times for a particular projectile/target material combination. From such release data, diffusion coefficients can be derived by fitting the theoretical results obtained by computational solution of Fick`s second equation to experimental data. The diffusion coefficient can be used subsequently to predict the release properties of the particular element from the same material in other target geometries and at other temperatures, provided that the activation energy is also known. Diffusion coefficients for Cl implanted into and diffused from CeS and Zr{sub 5}Si{sub 3} and As, Br, and Se implanted into and diffused from Zr{sub 5}Ge{sub 3} have been derived from the resulting intensity versus time profiles. Brief descriptions of the experimental apparatus and procedures utilized in the present experiments and plans for future related experiments are presented.
- Research Organization:
- Oak Ridge National Lab., TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 10120637
- Report Number(s):
- CONF-9406176--5; ON: DE95007006
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
665300
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ACTIVATION ENERGY
ADSORPTION
ARSENIC
BROMINE
CESIUM SULFIDES
CHLORINE 37
DESIGN
DIFFUSION
EFFICIENCY
FICK LAWS
HHIRF ACCELERATOR
INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
ION BEAM TARGETS
ION IMPLANTATION
LATTICE PARAMETERS
ORNL
PARTICLE BEAM PRODUCTION AND HANDLING
PERFORMANCE TESTING
SELENIUM
TANTALUM
TARGETS
VIBRATIONAL STATES
ZIRCONIUM COMPOUNDS