Selection of RIB targets using ion implantation

Conference · Sat Oct 01 00:00:00 EDT 1994

OSTI ID:10188185

Alton, G D; Dellwo, J; Chediak, J A ^[1]; Carter, H K ^[2]; Kormicki, J ^[2]

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1. Oak Ridge National Lab., TN (United States)
2. UNISOR, Oak Ridge, TN (United States)

Experimental studies are under way at the Oak Ridge National Laboratory (ORNL) which are designed to measure the time evolution, ionization efficiencies, and release efficiencies of implanted elements diffused from refractory target materials which are candidates for forming radioactive ion beams (RIBs) at the Holifield Radioactive Ion Beam Facility (HRIBF). The diffusion coefficients are derived by comparing experimental data with numerical solutions to a one-dimensional form of Fick`s second law for ion implanted distributions. In this report, we describe the experimental arrangement and provide time release data and diffusion coefficients for releasing ion implanted Cl from Zr{sub 5}Si{sub 3} and {sup 75}As, {sup 79}Br, and {sup 78}Se from Zr{sub 5}Ge{sub 3}.

• Research Organization: Oak Ridge National Lab., TN (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 10188185
• Report Number(s): CONF-940618--81; ON: DE95000951
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
430303
665300
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CHLORINE IONS
DIFFUSION
EXPERIMENTAL FACILITIES AND EQUIPMENT
HHIRF ACCELERATOR
INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
ION BEAM TARGETS
ION IMPLANTATION
IONIZATION
RADIOACTIVE ION BEAMS