Characterization of thermally annealed Sb implanted fused silica
- Fisk Univ., Nashville, TN (United States). Dept. of Physics
- Vanderbilt Univ., Nashville, TN (United States). Dept. of Applied and Engineering Sciences
- Oak Ridge National Lab., TN (United States)
The local environment of the polarizable ion in heavy metal oxide glasses is postulated to strongly influence the nonlinear response of these materials. The authors have previously observed that post-implantation thermal annealing changes the chemical properties of the implanted layer in a different fashion in Pb- and Bi- implanted SiO{sub 2}. In this paper the authors report the optical behavior of Sb-implanted SiO{sub 2} as a function of annealing temperature and atmosphere. High purity fused silica substrates were implanted at room temperature to a dose of 6 x 10{sup 16} ions/cm{sub 2} , and subsequently annealed at temperatures from 500 to 1000 C in argon and oxygen atmospheres. RBS, optical absorption (1.8 to 6.2 eV), infrared reflectance (450 to 5000 cm{sup {minus}1}), and nonlinear index of refraction were measured before and after annealing. The results of these measurements indicate that annealing treatment significantly affects the local environment of the implanted Sb ions, and consequently the optical response.
- Research Organization:
- Oak Ridge National Lab., TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States); National Aeronautics and Space Administration, Washington, DC (United States)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 10117037
- Report Number(s):
- CONF-931108--44; ON: DE94005464; CNN: Grant DAAH04-93-G-0123; Grant NAGW-2925
- Country of Publication:
- United States
- Language:
- English
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