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The growth of n-type GaSb by metal-organic chemical vapor deposition : effects of two-band conduction on carrier concentrations and donor activation.

Journal Article · · Proposed for publication in the Journal of Applied Physics.
OSTI ID:1002039

n-type GaSb has been prepared by metal-organic chemical vapour deposition with tellurium donors using diethyltelluride as the dopant precursor. The maximum carrier concentration achieved was 1.7 x 10{sup 18} cm{sup -3}, as measured by van der Pauw-Hall effect measurements, for an atomic tellurium concentration of 1.8 x 10{sup 19} cm{sup -3}. The apparent low activation of tellurium donors is explained by a model that considers the effect of electrons occupying both the {Lambda} and L bands in GaSb due to the small energy difference between the {Lambda} and L conduction band minima. The model also accounts for the apparent increase in the carrier concentration determined by van der Pauw-Hall effect measurements at cryogenic temperatures.

Research Organization:
Sandia National Laboratories
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
OSTI ID:
1002039
Report Number(s):
SAND2003-2572J
Journal Information:
Proposed for publication in the Journal of Applied Physics., Journal Name: Proposed for publication in the Journal of Applied Physics. Journal Issue: 8 Vol. 19; ISSN 1361-6641; ISSN SSTEET; ISSN 0268-1242
Country of Publication:
United States
Language:
English

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