Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers

Branton, Daniel; Golovchenko, Jene A.; King, Gavin M.; MoberlyChan, Warren J.; Schrmann, Gregor M.

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Title: Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers

Abstract

The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.

Inventors:: Branton, Daniel; Golovchenko, Jene A.; King, Gavin M.; MoberlyChan, Warren J.; Schrmann, Gregor M.

Issue Date:: Tue Apr 28 00:00:00 EDT 2009

Research Org.:: Harvard Univ., Cambridge, MA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1531586

Patent Number(s):: 7524431

Application Number:: 11/008,438

Assignee:: President and Fellows of Harvard College (Cambridge, MA)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

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B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
B82Y10/00 - Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/541 - {Heating or cooling of the substrates}
C23C14/5873 - {Removal of material}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L21/0331 - {for lift-off processes}

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S977/856 - including etching/cutting
Y10S977/857 - including coating
Y10S977/888 - Shaping or removal of materials, e.g. etching
Y10S977/89 - Deposition of materials, e.g. coating, cvd, or ald
Y10S977/891 - Vapor phase deposition

Show less

DOE Contract Number:: FG02-01ER45922

Resource Type:: Patent

Resource Relation:: Patent File Date: 2004-12-09

Country of Publication:: United States

Language:: English

Subject:: 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE

Citation Formats


                    Branton, Daniel, Golovchenko, Jene A., King, Gavin M., MoberlyChan, Warren J., and Schrmann, Gregor M. Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers.  United States: N. p., 2009. 
        Web.

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                    Branton, Daniel, Golovchenko, Jene A., King, Gavin M., MoberlyChan, Warren J., & Schrmann, Gregor M. Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers.  United States.

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                    Branton, Daniel, Golovchenko, Jene A., King, Gavin M., MoberlyChan, Warren J., and Schrmann, Gregor M. Tue .  
        "Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers".  United States.  https://www.osti.gov/servlets/purl/1531586.

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@article{osti_1531586,

  title        = {Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers},

  author       = {Branton, Daniel and Golovchenko, Jene A. and King, Gavin M. and MoberlyChan, Warren J. and Schrmann, Gregor M.},

  abstractNote = {The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Tue Apr 28 00:00:00 EDT 2009},

  month        = {Tue Apr 28 00:00:00 EDT 2009}

}

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Works referenced in this record:

Amorphous Water
journal, June 2004

Angell, C. Austen
Annual Review of Physical Chemistry, Vol. 55, Issue 1
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Process for fabricating cryogenic targets and targets made thereby
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Three dimensional imaging system
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Linear and Nonlinear Processes in the Erosion of $H_{2}$ O Ice by Fast Light Ions
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Brown, W. L.; Augustyniak, W. M.; Lanzerotti, L. J.
Physical Review Letters, Vol. 45, Issue 20
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Dry process for the production of microelectronic devices
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Okumura, Koji; Saeva, Franklin D.
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Methods for modifying surfaces
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Koberstein, Jeffrey T.; Wang, Peng; Pan, Feng
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Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
patent-application, November 2007

Golovchenko, Jene A.; King, Gavin M.; Schurmann, Gregor M.
US Patent Application 11/008402; 20070262050
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Nanometer Patterning with Ice
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King, Gavin M.; Schürmann, Gregor; Branton, Daniel
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Supercooled and glassy water
journal, October 2003

Debenedetti, Pablo G.
Journal of Physics: Condensed Matter, Vol. 15, Issue 45
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Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
patent, July 2007

Koops, Hans; Edinger, Klaus
US Patent Document 7,238,294
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Sublimation of vapor-deposited water ice below 170 K, and its dependence on growth conditions
journal, October 1993

Sack, N. J.; Baragiola, R. A.
Physical Review B, Vol. 48, Issue 14
https://doi.org/10.1103/PhysRevB.48.9973

On the mechanism of formation of amorphous condensates from the vapour phase (I). General theory
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Gutzov, I.; Avramov, I.
Journal of Non-Crystalline Solids, Vol. 16, Issue 1
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Dependence of the dissolution characteristics of As2S3 as a photoresist on the condensation rate and evaporation temperature
journal, May 1989

Mednikarov, B.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 7, Issue 3
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Thickness dependent crystallization kinetics of sub-micron amorphous solid water films
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Safarik, D. J.; Meyer, R. J.; Mullins, C. B.
The Journal of Chemical Physics, Vol. 118, Issue 10
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Works referencing / citing this record:

Nanotube processing employing solid-condensed-gas-layers
patent, September 2012

Golovchenko, Jene A.; King, Gavin M.; Schurmann, Gregor M.
US Patent Document 8,273,257
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8273257

Method of lift-off patterning thin films in situ employing phase change resists
patent, September 2014

Bahlke, Matthias; Baldo, Marc A.; Mendoza, Hiroshi Antonio
US Patent Document 8,841,152
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8841152

Method of forming organic thin film pattern and method of manufacturing organic light-emitting display device by using the method of forming organic thin film pattern
patent, October 2012

Lee, Kang-Il; Choi, Yong-Sup; Roh, Chool-Lae
US Patent Document 8,298,844
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8298844

Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
patent, August 2011

Golovchenko, Jene A.; King, Gavin M.; Schurmann, Gregor M.
US Patent Document 7,993,538
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7993538

Method for forming microscopic 3D structures
patent, December 2013

Faber, Jacob Simon; Mulders, Johannes Jacobus Lambertus; de Jong, Alan Frank
US Patent Document 8,597,565
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8597565

Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
patent, July 2012

Branton, Daniel; Golovchenko, Jene A.; King, Gavin M.
US Patent Document 8,221,595
URL: https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8221595

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Similar Records

Title: Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers

Abstract

Citation Formats

Amorphous Water journal, June 2004

Process for fabricating cryogenic targets and targets made thereby patent, August 1985

Three dimensional imaging system patent, January 2000

"Sputtering" of Ice by MeV Light Ions journal, April 1978

Linear and Nonlinear Processes in the Erosion of H 2 O Ice by Fast Light Ions journal, November 1980

Dry process for the production of microelectronic devices patent, September 1982

Methods for modifying surfaces patent-application, June 2007

Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers patent-application, November 2007

Nanometer Patterning with Ice journal, June 2005

Supercooled and glassy water journal, October 2003

Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface patent, July 2007

Sublimation of vapor-deposited water ice below 170 K, and its dependence on growth conditions journal, October 1993

On the mechanism of formation of amorphous condensates from the vapour phase (I). General theory journal, October 1974

Dependence of the dissolution characteristics of As2S3 as a photoresist on the condensation rate and evaporation temperature journal, May 1989

Thickness dependent crystallization kinetics of sub-micron amorphous solid water films journal, March 2003

Nanotube processing employing solid-condensed-gas-layers patent, September 2012

Method of lift-off patterning thin films in situ employing phase change resists patent, September 2014

Method of forming organic thin film pattern and method of manufacturing organic light-emitting display device by using the method of forming organic thin film pattern patent, October 2012

Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers patent, August 2011

Method for forming microscopic 3D structures patent, December 2013

Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers patent, July 2012

Amorphous Water
journal, June 2004

Process for fabricating cryogenic targets and targets made thereby
patent, August 1985

Three dimensional imaging system
patent, January 2000

"Sputtering" of Ice by MeV Light Ions
journal, April 1978

Linear and Nonlinear Processes in the Erosion of $H_{2}$ O Ice by Fast Light Ions
journal, November 1980

Dry process for the production of microelectronic devices
patent, September 1982

Methods for modifying surfaces
patent-application, June 2007

Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
patent-application, November 2007

Nanometer Patterning with Ice
journal, June 2005

Supercooled and glassy water
journal, October 2003

Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
patent, July 2007

Sublimation of vapor-deposited water ice below 170 K, and its dependence on growth conditions
journal, October 1993

On the mechanism of formation of amorphous condensates from the vapour phase (I). General theory
journal, October 1974

Dependence of the dissolution characteristics of As2S3 as a photoresist on the condensation rate and evaporation temperature
journal, May 1989

Thickness dependent crystallization kinetics of sub-micron amorphous solid water films
journal, March 2003

Nanotube processing employing solid-condensed-gas-layers
patent, September 2012

Method of lift-off patterning thin films in situ employing phase change resists
patent, September 2014

Method of forming organic thin film pattern and method of manufacturing organic light-emitting display device by using the method of forming organic thin film pattern
patent, October 2012

Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
patent, August 2011

Method for forming microscopic 3D structures
patent, December 2013

Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
patent, July 2012