Mask inspection microscopy with 13.2 nm table-top laser illumination
Journal Article
·
· Optics Letters
OSTI ID:941543
We report the demonstration of a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55 {+-} 3 nm. The microscope uses illumination from a table-top EUV laser to acquire aerial images of photolithography masks with a 20 second exposure time. The modulation transfer function of the optical system was characterized.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- Materials Sciences Division
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 941543
- Report Number(s):
- LBNL-1111E; OPLEDP; TRN: US200825%%566
- Journal Information:
- Optics Letters, Journal Name: Optics Letters; ISSN 0146-9592
- Country of Publication:
- United States
- Language:
- English
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