Evaluation of UV absorption coefficient in laser-modified fused silica
Journal Article
·
· Applied Physics Letters
OSTI ID:902337
Laser-induced damage in transparent dielectrics leads to the formation of laser-modified material as a result of exposure to extreme localized temperatures and pressures. In this work, we used an infrared thermal imaging system in combination with a fluorescence microscope to map the dynamics of the local surface temperature and fluorescence intensity under cw, UV excitation of laser-modified fused silica within a damage site. Based on a thermal diffusion model, we estimate the energy deposited via linear absorption mechanisms and derive the absorption coefficient of the modified material. In addition, irreversible changes in the absorption following extended laser exposure were observed.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 902337
- Report Number(s):
- UCRL-JRNL-224110; APPLAB; TRN: US200717%%261
- Journal Information:
- Applied Physics Letters, Vol. 90, Issue 6; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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OSTI ID:902337