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Title: Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients

Patent ·
OSTI ID:875071
 [1];  [2];  [3]
  1. 2262 Hampton Rd., Livermore, CA 94550
  2. 14 Jami St., Livermore, CA 94550
  3. 2927 Lorina St., #2, Berkeley, CA 94705-1852

A method and system for producing a thin film with highly uniform (or highly accurate custom graded) thickness on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source with controlled (and generally, time-varying) velocity. In preferred embodiments, the method includes the steps of measuring the source flux distribution (using a test piece that is held stationary while exposed to the source), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of sweep velocity modulation recipes, and determining from the predicted film thickness profiles a sweep velocity modulation recipe which is adequate to achieve a predetermined thickness profile. Aspects of the invention include a practical method of accurately measuring source flux distribution, and a computer-implemented method employing a graphical user interface to facilitate convenient selection of an optimal or nearly optimal sweep velocity modulation recipe to achieve a desired thickness profile on a substrate. Preferably, the computer implements an algorithm in which many sweep velocity function parameters (for example, the speed at which each substrate spins about its center as it sweeps across the source) can be varied or set to zero.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
DOE Contract Number:
W-7405-ENG-48
Assignee:
Folta; James A. (2262 Hampton Rd., Livermore, CA 94550); Montcalm; Claude (14 Jami St., Livermore, CA 94550); Walton; Christopher (2927 Lorina St., #2, Berkeley, CA 94705-1852)
Patent Number(s):
US 6524449
OSTI ID:
875071
Country of Publication:
United States
Language:
English

References (4)

Multilayer coating of 10X projection optics for extreme ultraviolet lithography conference June 1999
Advances in multilayer reflective coatings for extreme ultraviolet lithography conference June 1999
Design and performance of graded multilayers as focusing elements for x-ray optics journal August 1999
Multilayer reflective coatings for extreme-ultraviolet lithography conference June 1998