Liga developer apparatus system
- Pleasanton, CA
- San Francisco, CA
- Albuquerque, NM
A system to fabricate precise, high aspect ratio polymeric molds by photolithograpic process is described. The molds for producing micro-scale parts from engineering materials by the LIGA process. The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia National Laboratories (Livermore, CA)
- Patent Number(s):
- US 6517665
- OSTI ID:
- 875035
- Country of Publication:
- United States
- Language:
- English
Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)
|
journal | May 1986 |
|
conference | August 1999 |
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Related Subjects
developer
apparatus
fabricate
precise
aspect
ratio
polymeric
molds
photolithograpic
process
described
producing
micro-scale
engineering
materials
developing
pmma
photoresist
exposed
patterns
comprising
features
sizes
ratios
tank
intermediate
rinse
final
source
frequency
sonic
agitation
temperature
control
continuous
filtration
found
moving
patterned
wafer
specific
sequence
developerrinse
solutions
solution
completes
portions
resist
left
undeveloped
agitating
vibration
adjusting
closely
controlling
temperatures
continuously
filtering
recirculating
maintain
kinetic
dissolution
polymer
rate
limiting
step
temperature control
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