Removable pellicle for lithographic mask protection and handling
- Dublin, CA
- Albuquerque, NM
- Oakland, CA
- Sunnyvale, CA
- Livermore, CA
A removable pellicle for a lithographic mask that provides active and robust particle protection, and which utilizes a traditional pellicle and two deployments of thermophoretic protection to keep particles off the mask. The removable pellicle is removably attached via a retaining structure to the mask substrate by magnetic attraction with either contacting or non-contacting magnetic capture mechanisms. The pellicle retaining structural is composed of an anchor piece secured to the mask substrate and a frame member containing a pellicle. The anchor piece and the frame member are in removable contact or non-contact by the magnetic capture or latching mechanism. In one embodiment, the frame member is retained in a floating (non-contact) relation to the anchor piece by magnetic levitation. The frame member and the anchor piece are provided with thermophoretic fins which are interdigitated to prevent particles from reaching the patterned area of the mask. Also, the anchor piece and mask are maintained at a higher temperature than the frame member and pellicle which also prevents particles from reaching the patterned mask area by thermophoresis. The pellicle can be positioned over the mask to provide particle protection during mask handling, inspection, and pumpdown, but which can be removed manually or robotically for lithographic use of the mask.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Number(s):
- US 6492067
- OSTI ID:
- 874934
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
pellicle
lithographic
mask
protection
handling
provides
active
robust
particle
utilizes
traditional
deployments
thermophoretic
particles
removably
attached
via
retaining
structure
substrate
magnetic
attraction
contacting
non-contacting
capture
mechanisms
structural
composed
anchor
piece
secured
frame
containing
contact
non-contact
latching
mechanism
embodiment
retained
floating
relation
levitation
provided
fins
interdigitated
prevent
reaching
patterned
maintained
temperature
prevents
thermophoresis
positioned
provide
inspection
pumpdown
removed
manually
robotically
lithographic mask
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