Rapid method to detect duplex formation in sequencing by hybridization methods, a method for constructing containment structures for reagent interaction

Patent · Tue Jan 01 00:00:00 EST 2002

OSTI ID:874803

Mirzabekov, Andrei Darievich ^[1]; Yershov, Gennadiy Moiseyevich ^[2]; Guschin, Dmitry Yuryevich ^[3]; Gemmell, Margaret Anne ^[4]; Shick, Valentine V ^[1]; Proudnikov, Dmitri Y ^[5]; Timofeev, Edward N ^[1]

---

1. Moscow, RU
2. Zelenograd, RU
3. Hinsale, IL
4. Western Springs, IL
5. Samara, RU

A method for determining the existence of duplexes of oligonucleotide complementary molecules is provided whereby a plurality of immobilized oligonucleotide molecules, each of a specific length and each having a specific base sequence, is contacted with complementary, single stranded oligonucleotide molecules to form a duplex so as to facilitate intercalation of a fluorescent dye between the base planes of the duplex. The invention also provides for a method for constructing oligonucleotide matrices comprising confining light sensitive fluid to a surface, exposing said light-sensitive fluid to a light pattern so as to cause the fluid exposed to the light to polymerize into discrete units and adhere to the surface; and contacting each of the units with a set of different oligonucleotide molecules so as to allow the molecules to disperse into the units.

• Research Organization: Argonne National Laboratory (ANL), Argonne, IL (United States)
• DOE Contract Number: W-31109-ENG-38
• Assignee: University of Chicago (Chicago, IL)
• Patent Number(s): US 6465174
• OSTI ID: 874803
• Country of Publication: United States
• Language: English

Related Subjects

rapid
method
detect
duplex
formation
sequencing
hybridization
methods
constructing
containment
structures
reagent
interaction
determining
existence
duplexes
oligonucleotide
complementary
molecules
provided
plurality
immobilized
specific
length
base
sequence
contacted
single
stranded
form
facilitate
intercalation
fluorescent
dye
planes
provides
matrices
comprising
confining
light
sensitive
fluid
surface
exposing
light-sensitive
pattern
exposed
polymerize
discrete
units
adhere
contacting
set
allow
disperse
base sequence
light sensitive
hybridization methods
/435/427/999/