Porous body infiltrating method
Patent
·
OSTI ID:874507
- Ballston Lake, NY
A mixture is formed that comprises at least some to about 10 wt % boron nitride and silicon. A body comprising a component that is wetted by or reacts with silicon is contacted with the mixture and the contacted body is infiltrated with silicon from the mixture.
- Research Organization:
- General Electric Co., Boston, MA (United States)
- DOE Contract Number:
- FC02-92CE41000
- Assignee:
- General Electric Company (Schenectady, NY)
- Patent Number(s):
- US 6403158
- OSTI ID:
- 874507
- Country of Publication:
- United States
- Language:
- English
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