Process for removal of water and silicon mu-oxides from chlorosilanes
- New Milford, CT
- Danbury, CT
A scavenger composition having utility for removal of water and silicon mu-oxide impurities from chlorosilanes, such scavenger composition comprising: (a) a support; and (b) associated with the support, one or more compound(s) selected from the group consisting of compounds of the formula: R.sub.a-x MCl.sub.x wherein: M is a metal selected from the group consisting of the monovalent metals lithium, sodium, and potassium; the divalent metals magnesium, strontium, barium, and calcium; and the trivalent metal aluminum; R is alkyl; a is a number equal to the valency of metal M; and x is a number having a value of from 0 to a, inclusive; and wherein said compound(s) of the formula R.sub.a-x MCl.sub.x have been activated for impurity-removal service by a reaction scheme selected from those of the group consisting of: (i) reaction of such compound(s) with hydrogen chloride to form a first reaction product therefrom, followed by reaction of the first reaction product with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y, wherein y is a number having a value of from 1 to 3, inclusive; and (ii) reaction of such compound(s) with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y wherein y is a number having a value of 1 to 3, inclusive. A corresponding method of making the scavenger composition, and of purifying a chlorosilane which contains oxygen and silicon mu-oxide impurities, likewise are disclosed, together with a purifier apparatus, in which a bed of the scavenger composition is disposed. The composition, purification process, and purifier apparatus of the invention have utility in purifying gaseous chlorosilanes which are employed in the semiconductor industry as silicon source reagents for forming epitaxial silicon layers.
- Research Organization:
- ADVANCED TECHNOLOGY MATERIALS
- DOE Contract Number:
- AC01-87ER80469
- Assignee:
- Novapure Corporation (Danbury, CT)
- Patent Number(s):
- US 5094830
- Application Number:
- 07/737,181
- OSTI ID:
- 868186
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
removal
water
silicon
mu-oxides
chlorosilanes
scavenger
composition
utility
mu-oxide
impurities
comprising
support
associated
compound
selected
consisting
compounds
formula
a-x
mcl
metal
monovalent
metals
lithium
sodium
potassium
divalent
magnesium
strontium
barium
calcium
trivalent
aluminum
alkyl
equal
valency
value
inclusive
activated
impurity-removal
service
reaction
scheme
hydrogen
chloride
form
product
therefrom
followed
chlorosilane
sih
4-y
ii
corresponding
method
purifying
contains
oxygen
likewise
disclosed
purifier
apparatus
bed
disposed
purification
gaseous
employed
semiconductor
industry
source
reagents
forming
epitaxial
layers
trivalent metal
silicon source
monovalent metals
silicon layer
composition comprising
reaction product
hydrogen chloride
metal selected
scavenger composition
reaction scheme
purification process
silicon layers
metal aluminum
oxide impurities
mu-oxide impurities
silicon mu-oxide
divalent metals
product therefrom
silicon mu-oxides
epitaxial silicon
contains oxygen
corresponding method
forming epitaxial
divalent metal
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