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Title: Background-reducing X-ray multilayer mirror

Patent ·
OSTI ID:868164

Background-reducing x-ray multilayer mirror. A multiple-layer "wavetrap" deposited over the surface of a layered, synthetic-microstructure soft x-ray mirror optimized for reflectivity at chosen wavelengths is disclosed for reducing the reflectivity of undesired, longer wavelength incident radiation incident thereon. In three separate mirror designs employing an alternating molybdenum and silicon layered, mirrored structure overlaid by two layers of a molybdenum/silicon pair anti-reflection coating, reflectivities of near normal incidence 133, 171, and 186 .ANG. wavelengths have been optimized, while that at 304 .ANG. has been minimized. The optimization process involves the choice of materials, the composition of the layer/pairs as well as the number thereof, and the distance therebetween for the mirror, and the simultaneous choice of materials, the composition of the layer/pairs, and their number and distance for the "wavetrap."

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 5086443
OSTI ID:
868164
Country of Publication:
United States
Language:
English

References (4)

Reflection / Suppression Coatings For 900 - 1200 A Radiation conference July 1989
Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 Å to 1216 Å journal January 1988
Metal multilayer mirrors for EUV/ultrasoft x-ray wide-field telescopes journal January 1990
Layered Synthetic Microstructures: Properties And Applications In X-Ray Astronomy conference August 1979