Interface characterization of XUV multilayer reflectors using HRTEM (high-resolution transmission electron microscopy) and x-ray and XUV reflectance
Conference
·
OSTI ID:6360305
We have examined the structure of XUV multilayer coatings using high-resolution transmission electron microscopy (HRTEM). Using a variety of techniques, we have measured the interface widths and the interface topography from the digitized TEM images, and have compared these results to x-ray and XUV reflectance measurements. We find that the structural parameters measured from the TEM images and those deduced from reflectance are consistent in light of the probable systematic errors associated with the measurement and interpretation techniques. 14 refs., 12 figs., 1 tab.
- Research Organization:
- Lawrence Berkeley Lab., CA (USA)
- Sponsoring Organization:
- DOE/ER
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 6360305
- Report Number(s):
- LBL-29618; CONF-900756-54; ON: DE91004411
- Resource Relation:
- Conference: SPIE's international symposium on optical and optoelectronic applied science and engineering exhibit, San Diego, CA (USA), 8-13 Jul 1990
- Country of Publication:
- United States
- Language:
- English
Similar Records
X-ray reflectivity and transmission electron microscopy studies on thin and ultrathin W/C and W/Si multilayers structures
Investigations of substitutional impurity segregation to the {Sigma}5(310)/[001] STGB in FCC metals: a EFTEM and HRTEM study
Synchrotron White Beam X-ray Topography, Transmission Electron Microscopy and High Resolution X-ray Diffraction Studies of Defects and Strain Relaxation Processes in Wide Bandgap Semiconductor Crystals and Thin Films
Journal Article
·
Mon May 01 00:00:00 EDT 1989
· J. Appl. Phys.; (United States)
·
OSTI ID:6360305
Investigations of substitutional impurity segregation to the {Sigma}5(310)/[001] STGB in FCC metals: a EFTEM and HRTEM study
Conference
·
Wed Mar 01 00:00:00 EST 2000
·
OSTI ID:6360305
+1 more
Synchrotron White Beam X-ray Topography, Transmission Electron Microscopy and High Resolution X-ray Diffraction Studies of Defects and Strain Relaxation Processes in Wide Bandgap Semiconductor Crystals and Thin Films
Journal Article
·
Sun Jan 01 00:00:00 EST 2006
· Materials Science in Semiconductor Processing
·
OSTI ID:6360305
+3 more
Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
47 OTHER INSTRUMENTATION
REFLECTIVE COATINGS
TRANSMISSION ELECTRON MICROSCOPY
SURFACE COATING
INTERFACES
DIFFUSION
EXTREME ULTRAVIOLET RADIATION
THIN FILMS
TOPOGRAPHY
X-RAY DIFFRACTION
COATINGS
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
FILMS
MICROSCOPY
RADIATIONS
SCATTERING
ULTRAVIOLET RADIATION
656003* - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)
440600 - Optical Instrumentation- (1990-)
SUPERCONDUCTIVITY AND SUPERFLUIDITY
47 OTHER INSTRUMENTATION
REFLECTIVE COATINGS
TRANSMISSION ELECTRON MICROSCOPY
SURFACE COATING
INTERFACES
DIFFUSION
EXTREME ULTRAVIOLET RADIATION
THIN FILMS
TOPOGRAPHY
X-RAY DIFFRACTION
COATINGS
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
FILMS
MICROSCOPY
RADIATIONS
SCATTERING
ULTRAVIOLET RADIATION
656003* - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)
440600 - Optical Instrumentation- (1990-)