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Title: Double rf system for bunch shortening

Conference ·
OSTI ID:6185482

It was suggested by Zisman that the combination of the two systems (double rf system) may be more effective to shorten a bunch, compromising between the desirable and the undesirable effects mentioned above. In this paper, we demonstrate that a double rf system is, in fact, quite effective in optimizing the rf performance. The parameters used are explained, and some handy formulae for bunch parameters are derived. We consider an example of bunch shortening by adding a higher-harmonic rf system to the main rf system. The parameters of the main rf system are unchanged. The double rf system, however, can be used for another purpose. Namely, the original bunch length can be obtained with a main rf voltage substantially lower than for a single rf system without necessitating a high-power source for the higher-harmonic cavities. Using a double rf system, the momentum acceptance remains large enough for ample beam lifetime. Moreover, the increase in nonlinearity of the rf waveform increases the synchrotron tune spread, which potentially helps a beam to be stabilized against longitudinal coupled-bunch instabilities. We will show some examples of this application. We discuss the choice of the higher-harmonic frequency.

Research Organization:
Lawrence Berkeley Lab., CA (USA)
Sponsoring Organization:
DOE/ER
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6185482
Report Number(s):
LBL-29622; CONF-9010276-3; ON: DE91009094; TRN: 91-008203
Resource Relation:
Conference: International workshop on accelerators for asymmetric B-factories, Tsukuba (Japan), 4-6 Oct 1990
Country of Publication:
United States
Language:
English