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Title: Synthesis of silane and silicon in a nonequilibrium plasma jet. Final report

Technical Report ·
DOI:https://doi.org/10.2172/5868372· OSTI ID:5868372

The original objective of this program was to determine the feasibility of high volume, low-cost production of high purity silane or solar cell grade silicon using a nonequilibrium plasma jet. The emphasis was changed near the end of the program to determine the feasibility of preparing photovoltaic amorphous silicon films directly using this method. The nonequilibrium plasma jet is produced by partially dissociating hydrogen to hydrogen atoms in a 50 to 100 Torr glow discharge and expanding the H/H/sub 2/ mixture through a nozzle. A high flux density of hydrogen atoms is thus produced at concentrations of about 3 mol % with about 30% energy utilization efficiency. The jet is mixed with a second reactant and the reaction proceeds at a temperature of 400 to 600/sup 0/K to produce products. Yields of SiH/sub 4/, SiHCl/sub 3/, or SiH/sub 2/Cl/sub 2/ from SiCl/sub 4/ and SiHCl/sub 3/ were too low to be economically attractive. However, both amorphous and polycrystalline silicon films which strongly adhered to Pyrex, Vycor, aluminum, or carbon were prepared with either SiCl/sub 4/ or SiHCl/sub 3/ reactants. Preliminary doping experiments with PH/sub 3/ did not alter the electrical resistivity of these films. Strongly adhering films with SiH/sub 4/ reactant were more difficult to prepare; they were prepared by carefully cleaning the aluminum substrate, diluting the SiH/sub 4/ with about 90% argon, and forming the glow discharge between the mixing nozzle and the aluminum substrate. Doping such films with P by adding PH/sub 3/ reduced the electrical resistivity by two orders of magnitude. The nonequilibrium plasma jet should be further evaluated as a technique for producing high efficiency photovoltaic amorphous silicon films.

Research Organization:
Aerochem Research Labs., Inc., Princeton, NJ (USA)
DOE Contract Number:
NAS-7-100-954560
OSTI ID:
5868372
Report Number(s):
DOE/JPL/954560-8
Country of Publication:
United States
Language:
English