Copper alloys for interconnectors and methods for making the same
Patent
·
OSTI ID:2293685
Metallic alloy interconnects (which can comprise copper) with low electrical resistivity and methods for making the same are disclosed. The electrical resistivity of thin film copper alloys was reduced by 36% with niobium solute and by 51% with iron solute compared to pure copper counterpart in dilute solute regimes (0-1.5 atomic %). The fabrication method is operated at room temperature, and does not require a high temperature annealing step.
- Research Organization:
- Univ. of Pennsylvania, Philadelphia, PA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- SC0008135
- Assignee:
- The Trustees of the University of Pennsylvania (Philadelphia, PA)
- Patent Number(s):
- 11,776,893
- Application Number:
- 16/624,045
- OSTI ID:
- 2293685
- Resource Relation:
- Patent File Date: 06/19/2018
- Country of Publication:
- United States
- Language:
- English
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