Laser drilling and machining enhancement using gated CW and short pulsed lasers

Patent · Tue Aug 01 00:00:00 EDT 2023

OSTI ID:2222024

Ly, Sonny S.; Bude, Jeffrey D.; Guss, Gabriel Mark; Keller, Wesley John; Negres, Raluca A.; Rubenchik, Alexander M.; Shen, Nan

The present disclosure relates to a laser system for processing a material. The system may make use of a laser configured to intermittently generate a first laser pulse of a first duration and a first average power, at a spot on a surface of the material being processed, and a second laser pulse having a second duration and a second peak power. The second duration may be shorter than the first duration by a factor of at least 100, and directed at the spot. The second laser pulse is generated after the first laser pulse is generated. The first laser pulse is used to heat the spot on the surface of the material, while the second laser pulse induces a melt motion and material ejection of molten material from the melt pool.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC52-07NA27344
• Assignee: Lawrence Livermore National Security, LLC (Livermore, CA)
• Patent Number(s): 11,712,750
• Application Number: 17/040,155
• OSTI ID: 2222024
• Resource Relation: Patent File Date: 03/22/2019
• Country of Publication: United States
• Language: English