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Title: Materials and methods for selective noble gas adsorption

Patent ·
OSTI ID:1924957

An adsorptive material for adsorption of a noble gas can include a mesoporous support material having a plurality of pores and a pattern of metal atoms deposited onto the mesoporous support material.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-06CH11357
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Number(s):
11,406,960
Application Number:
16/583,851
OSTI ID:
1924957
Resource Relation:
Patent File Date: 09/26/2019
Country of Publication:
United States
Language:
English

References (11)

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Atomic Layer Deposition of Ultrathin Copper Metal Films from a Liquid Copper(I) Amidinate Precursor journal January 2006
Adsorption of inert gases including element 118 on noble metal and inert surfaces from ab initio Dirac–Coulomb atomic calculations journal October 2008
Atomic Layer Deposition of Gold Metal journal December 2015
Use of Titania Precursor Composition Pattern patent-application July 2015
Studies on Thermal Atomic Layer Deposition of Silver Thin Films journal March 2017
Method for Patterning a Surface patent-application December 2009
Atomic Layer Deposition of Platinum Thin Films journal May 2003
Zeolite-substrate composite comprising a patterned zeolite layer on a substrate and preparation thereof patent February 2004