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Title: Nanoscale Antiferromagnetic Domain Imaging using Full-Field Resonant X-ray Magnetic Diffraction Microscopy

Journal Article · · Advanced Materials
 [1];  [2];  [3];  [3];  [2];  [1];  [2];  [4]; ORCiD logo [1];  [3]
  1. Chung-Ang Univ., Seoul (Korea, Republic of)
  2. Argonne National Lab. (ANL), Lemont, IL (United States). Advanced Photon Source (APS)
  3. Pohang Univ. of Science and Technology (POSTECH) (Korea, Republic of); Institute for Basic Science, Seoul (Korea, Republic of)
  4. Argonne National Lab. (ANL), Lemont, IL (United States)

Abstract The physical properties of magnetic materials frequently depend not only on the microscopic spin and electronic structures, but also on the structures of mesoscopic length scales that emerge, for instance, from domain formations, or chemical and/or electronic phase separations. However, experimental access to such mesoscopic structures is currently limited, especially for antiferromagnets with net zero magnetization. Here, full‐field microscopy and resonant magnetic X‐ray diffraction are combined to visualize antiferromagnetic (AF) domains of the spin–orbit Mott insulator Sr 2 IrO 4 with area over ≈0.1 mm 2 and with spatial resolution as high as ≈150 nm. With the unprecedented wide field of views and high spatial resolution, an intertwining of two AF domains on a length comparable to the measured average AF domain wall width of 545 nm is revealed. This mesoscopic structure comprises a substantial portion of the sample surface, and thus can result in a macroscopic response unexpected from its microscopic magnetic structure. In particular, the symmetry analysis presented in this work shows that the inversion symmetry, which is preserved by the microscopic AF order, becomes ill‐defined at the mesoscopic length scale. This result underscores the importance of this novel technique for a thorough understanding of the physical properties of antiferromagnets.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Organization:
National Research Foundation of Korea (NRF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; USDOE
Grant/Contract Number:
AC02-06CH11357; NRF-2019K1A3A7A09033393; 2020R1C1C1012424; 2020R1A5A1016518
OSTI ID:
1879107
Alternate ID(s):
OSTI ID: 1877420
Journal Information:
Advanced Materials, Vol. 34, Issue 29; ISSN 0935-9648
Publisher:
WileyCopyright Statement
Country of Publication:
United States
Language:
English

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