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Title: Inviscid damping of an elliptical vortex subject to an external strain flow

Journal Article · · Physics of Plasmas
DOI:https://doi.org/10.1063/5.0086227· OSTI ID:1870642

Inviscid spatial Landau damping is studied experimentally for the case of oscillatory motion of a two-dimensional vortex about its elliptical equilibrium in the presence of an applied strain flow. Here, the experiments are performed using electron plasmas in a Penning–Malmberg trap. They exploit the isomorphism between the two-dimensional Euler equations for an ideal fluid and the drift-Poisson equations for the plasma, where plasma density is the analog of vorticity. Perturbed elliptical vortex states are created using E x B strain flows, which are generated by applying voltages to electrodes surrounding the plasma. Measurements of spatial Landau damping (also called critical-layer damping) are in agreement with previous studies in the absence of an applied strain, where the damping is due to a resonance between the local fluid motion and the vortex oscillations. Interestingly, the damping rate does not change significantly over a wide range of applied strain rates. This can be accurately predicted from the initial vorticity profile, even though the resonant frequency is reduced substantially due to the applied strain. For higher amplitude perturbations, nonlinear trapping oscillations also exhibit behavior similar to the strain-free case. In principle, higher-order effects of the applied strain, such as separatrix crossing of peripheral vorticity and interactions with harmonics of the fundamental resonance, are expected to change the damping rate. However, this occurs only for conditions that are not realized in the experiments described here. Vortex-in-cell simulations are used to investigate the possible roles of these effects.

Research Organization:
Univ. of California, San Diego, La Jolla, CA (United States)
Sponsoring Organization:
USDOE; National Science Foundation (NSF)
Grant/Contract Number:
SC0016532; SC0018236; PHY 2106332
OSTI ID:
1870642
Alternate ID(s):
OSTI ID: 1867510; OSTI ID: 1991372
Journal Information:
Physics of Plasmas, Vol. 29, Issue 5; ISSN 1070-664X
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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